Effect of the temperature on the accumulation of absorption centers in F4MB/Al coatings irradiated with electrons

Статья в журнале

The change in the reflectance spectra of the pristine and electron-irradiated fluoroplastic films F4MB with sputtered aluminum at different temperatures was studied. The decomposition of the Δρλ spectra into components showed that with temperature increasing, the intensity of some bands decreases linearly, others exponentially, and the third ones along a curve with a minimum. It has been established that the bands of the first group are determined by the simplest CF2, CF3, and CF2–CF2 radicals; the bands of the second group are formed by the CF2CO, CF3COF, CF2–CF3 radicals, and C3F6, C2F6 molecules; and the bands of the third group are defined by the absorption of the largest (CF2–CF3–CF2), C4F7, and C4F8 radicals. The largest contribution to the total absorption spectrum is made by the CF3, CF2–CF3, CF2–CF3–CF2 radicals, and CF2CO, CF3COF molecules.

Журнал:

• Indian Journal of Physics
• Springer (Albrechtsfeld)
• Индексируется в Scopus, Web of Science

Библиографическая запись: Mikhailov, M. M. Effect of the temperature on the accumulation of absorption centers in F4MB/Al coatings irradiated with electrons [Electronic resource] / M. M. Mikhailov, A. N. Sokolovskiy // Indian Journal of Physics. – 2022. – DOI: 10.1007/s12648-022-02421-0

Индексируется в:

• Scopus ( https://www.scopus.com/record/display.uri?eid=2-s2.0-85138432732&origin=resultslist&sort=plf-f )