Deposition of boron-containing coatings by electron-beam evaporation of boron-containing targets

Статья в журнале

Boron-containing films are promising materials for improving the hardness, wear-resistance and durability of mechanical parts used in industry. We describe a novel approach for deposition of such coatings – by using electron-beam evaporation of boron-containing target material (pure boron or boron nitride) in inert (helium) or chemically-active (oxygen, nitrogen, residual atmosphere) gases at medium vacuum. Boron-containing films deposited on titanium substrates were characterized using a nanohardness tester and a non-contact 3D profilometer. Elemental composition of the coatings was studied using raster electron microscope equipped with a device for EDX analysis. All boron-containing coatings provided significant improvement (by a factor of 4–16) in the microhardness of the substrate surface.

Журнал:

Ceramics International
Elsevier Science Publishing Company, Inc. (Amsterdam)
Индексируется в Scopus, Web of Science

Библиографическая запись: Deposition of boron-containing coatings by electron-beam evaporation of boron-containing targets / Yu. G. Yushkov [et al.] // Ceramics International. – 2020. – Vol. 46. – Iss. 4 – P. 4519-4525. – DOI: 10.1016/j.ceramint.2019.10.179

Ключевые слова:

BORON-CONTAINING COATINGS ELECTRON BEAM DEPOSITION MEDIUM VACUUM FORE-VACUUM PLASMA-CATHODE ELECTRON SOURCE

Индексируется в:

Авторы: Юшков Ю. Г., Окс Е. М., Тюньков А. В., Корбелла К., Золотухин Д. Б.

Год издания: 2020

Страницы: 4519 - 4525

Язык: Английский

DOI: 10.1016/j.ceramint.2019.10.179